LaAlO3, (110) orn. EPI polishing 3" x 0.5mm wafer 1 SP --- MTI Special !!!-1

LaAlO3, (110) orn. EPI polishing 3" x 0.5mm wafer 1 SP --- MTI Special !!!-1Substrate Specifcations: Wafer Size: 3" dia + 0. 5 mm x 0. 5 thickness + 0. 05 mm Wafer Orientation: (110) + 0. 5 Deg Edge Orientation: <001> + 1 Deg with 20 mm Length Polishing: CMP polished with free sub surface damaged Surface finish (RMS or Ra) : < 15A Package: Under 1000 class clean room, and in 100 grade plastic bag in a wafer container. Lattice Constant a=3. 792Pseudo cubic Warning: LaAlO3 crystal has a visible twin on a polished surface, which

The cell is well sealed by electrolyte corrosive-proof PTFE O-rings

high production efficiency

Size:          1/4" x 1/4" x 0

the resistance of heating elements will not be affected by aging under normal operating conditions

please use compressed air to blow all water from inside of the vortex sharper before the experiment

109mm Outside diameter 103mm Pitch

Dimensions when free: 5 mm OD × 3

Doping: S doped

simply arrange them in a dock station and have it connected to MTI multi-channel battery analyzer for cycle life

Crystal structure: Orthorhombic

User-friendly Computer control interface can easily program heating steps

Average Grain Size:                              10~50 Microns  ( No annealling )