Titanium (Ti) Metallic Substrate: 10x10x0.5 mm, 1side polished - mcTi101005S1

Titanium (Ti) Metallic Substrate: 10x10x0.5 mm, 1side polished - mcTi101005S1Polycrystal Ti metallic substrate Purity: > 99. 9% Density: 4. 506 g cm3 Melting Point: 1668C Size: 10x10x0. 5 mm Surface finish: One side polished < 30A by AFM within a 5x5 micron area Application: substrates for metal, alloy film, and biological materials Please click the element below to find other metallic foil Ag Cu Mg Pb W Film Coater Al Fe SS Mo Pd Ta Au Hf Nb Ti Zr Be In C Li Ni V Zn

Please always check STO substrate before grown

70)x10^-3 ohm

Frequency Resolution +/- 0

cutting depth

a 20mm cutting die can be used for cutting electrode discs and a 24mm cutting die can be used for cutting either electrode discs or separator discs

The digital micrometer:

Orientation:  (100) with 2 degree miscut in <011>

Coin Cell Cases & Related Components                                                 Components for Li-air Cell

Repalcement for

please click the picture for detail:

SiO2 layer on 3" Silicon wafer

Purity:            99%